描述
MASK AND WAFER / SUBSTRATE
Wafer Size up to 150 mm
Substrate Size up to 6″ x 6″
Pieces down to 5 x 5 mm
Mask Size SEMI spec, standard up to 7″ x 7″
EXPOSURE OPTICS
Resolution see page 5
down to 0.5 μm
Wavelength Range UV400 350 – 450 nm
UV300 280 – 350 nm
UV250 240 – 260 nm
Exposure Source Hg lamps 200 – 1000 W
HgXe lamp 500 W
Intensity Uniformity ± 5 %
± 2.5 % (MO Exposure Optics)
ALIGNMENT STAGE
Movement Range X: ± 10 mm
Y: ± 5 mm
θ: ± 5°
Mechanical Accuracy 0.1 μm (step size)
